| 1. | Magnetization magneto - microwave plasma etching system
磁场微波型等离子体蚀刻系统 |
| 2. | Generic specification of ion beam etching system
离子束蚀刻机通用技术条件 |
| 3. | Inductively coupled plasma etching system
感应耦合型等离子体蚀刻系统 |
| 4. | Narrow gap reactive ion etching system
狭窄间隙反应性离子蚀刻系统 |
| 5. | Reactive ion beam etching system ribe system
反应性离子束蚀刻系统 |
| 6. | Reactive ion etching system rie system
反应性离子蚀刻系统 |
| 7. | Barrel type plasma etching system
圆筒型等离子体蚀刻系统 |
| 8. | Reactive sputter etching system
反应性溅镀蚀刻系统 |
| 9. | Photo excited etching system
光激励蚀刻系统 |
| 10. | Immersion wet etching system
浸渍式蚀刻系统 |
